Process for preparing resin-linear organosiloxane block copolymers

ABSTRACT

A process is disclosed for preparing a resin-linear organosiloxane block copolymer by reacting in a first step an endcapped linear organosiloxane and an organosiloxane resin to form a resin-linear organosiloxane block copolymer. The resulting resin-linear organosiloxane block copolymer is then crosslinked in a second step to sufficiently increase the average molecular weight of the resin-linear organosiloxane block copolymer by at least 50%. The resin-linear organosiloxanes block copolymers prepared by the disclosed process may provide optically solid compositions which may be considered as “reprocessable”.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of U.S. Application No. 61/385,446 as filed on 22 Sep., 2010, U.S. Application No. 61/537,146 as filed on 21 Sep., 2011, and U.S. Application No. 61/537,151 as filed on 21 Sep., 2011.

BACKGROUND OF THE INVENTION

There is a continuing need to identify protective and/or functional coatings in many areas of emerging technologies. For example, most light emitting diodes (LEDs) and solar panels use an encapsulant coating to protect photovoltaic cells from environmental factors. Such protective coatings must be optically clear to ensure maximum efficiency of these devices. Furthermore, these protective coatings must also be tough, durable, long lasting, and yet easy to apply. Various silicone based compositions are known in the art as protective coatings in various electronics and solar devices since silicones are known for their durability.

Many of the silicone compositions used to provide protective electronic coatings today rely on cure mechanisms that require a catalyst in the product compositions. For example, platinum metal catalyzed cure of a silicone composition containing an alkenyl functional organopolysiloxane and an organohydrogensiloxane are very prevalent in the art. However, the subsequent coatings resulting from these hydrosilylation cured systems still have trace amounts of catalyst remaining in the final product. Furthermore, the cure chemistry requires a certain amount of hydrocarbon groups be present on the siloxane polymers. Both the residual catalyst, and presence of hydrocarbon crosslinks may limit the thermal stability and/or long term durability of such coatings.

Thus, there is a need to identify silicone based encapsulants that are optically clear while remaining tough and durable. In particular, there is a need to identify such silicone based coatings that provide convenience of use in the manufacture of various electronic or lighting devices. Ideally, the silicone composition should be considered to be “reprocessable”, in that an initial coating can reflow around device architectures at an elevated processing temperature. Also, the coatings or other solid materials may be initially formed from a silicone composition having certain physical properties, but possess sufficient reactivity to further cure at elevated temperatures to provide coatings with another set of physical properties.

BRIEF SUMMARY OF THE INVENTION

The present process provides organosiloxane copolymers that may be described as “resin-linear” organosiloxane block copolymers. The present process provides resin-linear organosiloxanes block copolymers that may yield optically clear coatings. The resin-linear organosiloxanes block copolymers, and subsequent solid compositions derived from them, may be considered as “reprocessable”.

The present disclosure relates to a process for preparing a resin-linear organosiloxane block copolymer comprising:

-   -   I) reacting         -   a) a linear organosiloxane having the formula

R¹ _(q)(E)_((3-q))SiO(R¹ ₂SiO_(2/2))_(n)Si(E)_((3-q))R¹ _(q),

-   -   -   -   where each R¹ is independently a C₁ to C₃₀ hydrocarbyl,             -   n is 10 to 400, q is 0, 1, or 2,             -   E is a hydrolyzable group containing at least one carbon                 atom, and

        -   b) an organosiloxane resin comprising at least 60 mol % of             [R²SiO_(3/2)] siloxy units in its formula, where each R² is             independently a C₁ to C₂₀ hydrocarbyl,

        -   in c) an organic solvent

        -   to form a resin-linear organosiloxane block copolymer;             -   wherein the amounts of a) and b) used in step I are                 selected to provide the resin-linear organosiloxane                 block copolymer with 40 to 90 mol % of disiloxy units                 [R¹ ₂SiO_(2/2)] and 10 to 60 mol % of trisiloxy units                 [R²SiO_(3/2)], and wherein at least 95 weight percent of                 the linear organosiloxane added in step I is                 incorporated into the resin-linear organosiloxane block                 copolymer,

    -   II) reacting the resin-linear organosiloxane block copolymer         from step I) to crosslink the trisiloxy units of the         resin-linear organosiloxane block copolymer sufficiently to         increase the average molecular weight of the resin-linear         organosiloxane block copolymer by at least 50%,

    -   III) optionally, further processing the resin-linear         organosiloxane block copolymer to enhance storage stability         and/or optical clarity,

    -   IV) optionally, removing the organic solvent.

The present disclosure further relates to the resin-linear organosiloxane copolymer compositions prepared by the processes described herein, and subsequently formed solid compositions derived from these compositions.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1—AFM of a thin film of the resin-linear organosiloxane block copolymer of Example 3, showing dispersed nano-size particles

FIG. 2—A rheology curve of a representative resin-linear organosiloxane block copolymer demonstrating “reprocessabililty” behavior

FIG. 3—TEM (using cryo-microtomy) of thin section of the solid resin-linear organosiloxane block copolymer of Example 10

DETAILED DESCRIPTION OF THE INVENTION

The present process provides organopolysiloxanes that are described herein as “resin-linear” organosiloxane block copolymers.

Organopolysiloxanes are polymers containing siloxy units independently selected from (R₃SiO_(1/2)), (R₂SiO_(2/2)), (RSiO_(3/2)), or (SiO_(4/2)) siloxy units, where R may be any organic group. These siloxy units are commonly referred to as M, D, T, and Q units respectively. These siloxy units can be combined in various manners to form cyclic, linear, or branched structures. The chemical and physical properties of the resulting polymeric structures vary depending on the number and type of siloxy units in the organopolysiloxane. “Linear” organopolysiloxanes typically contain mostly D or (R₂SiO_(2/2)) siloxy units, which results in polydiorganosiloxanes that are fluids of varying viscosity, depending on the “degree of polymerization” or “dp” as indicated by the number of D units in the polydiorganosiloxane. “Resin” organopolysiloxanes result when a majority of the siloxy units are selected from T or Q siloxy units. When T siloxy units are predominately used to prepare an organopolysiloxane, the resulting organosiloxane is often referred to as a “silsesquioxane resin”. Increasing the amount of T or Q siloxy units in an organopolysiloxane typically results in polymers having increasing hardness and/or glass like properties. “Resin” organopolysiloxanes thus have higher T_(g) values, for example siloxane resins often have T_(g) values greater than 50° C.

As used herein “resin-linear organosiloxane copolymers” refer to organopolysiloxanes containing “linear” D siloxy units in combination with “resin” T or Q siloxy units. The present process provides organosiloxane copolymers that are “block” copolymers, as opposed to “random” copolymers. Furthermore, “resin-linear organosiloxanes copolymers” as used herein refer to organopolysiloxanes containing D and T units, were the D unit are primarily bonded together to form “linear blocks” having 10 to 400 D units. The T units are primarily bonded to each other to form branched polymeric chains, which are referred to as “non-linear blocks”. A significant number of these non-linear blocks may further aggregate to form “nano-domains” when solid forms of the block copolymer are provided.

The present process for preparing a resin-linear organosiloxane block copolymer comprises:

-   -   I) reacting         -   a) a linear organosiloxane having the formula

R¹ _(q)(E)_((3-q))SiO(R¹ ₂SiO_(2/2))_(n)Si(E)_((3-q))R¹ _(q),

-   -   -   -   where each R¹ is independently a C₁ to C₃₀ hydrocarbyl,             -   n is 10 to 400, q is 0, 1, or 2,             -   E is a hydrolyzable group containing at least one carbon                 atom, and

        -   b) an organosiloxane resin comprising at least 60 mol % of             [R²SiO_(3/2)] siloxy units in its formula, where each R² is             independently a C₁ to C₂₀ hydrocarbyl,

        -   in c) an organic solvent

        -   to form a resin-linear organosiloxane block copolymer;             -   wherein the amounts of a) and b) used in step I are                 selected to provide the resin-linear organosiloxane                 block copolymer with 40 to 90 mol % of disiloxy units                 [R¹ ₂SiO_(2/2)] and 10 to 60 mol % of trisiloxy units                 [R²SiO_(3/2)], and wherein at least 95 weight percent of                 the linear organosiloxane added in step I is                 incorporated into the resin-linear organosiloxane block                 copolymer,

    -   II) reacting the resin-linear organosiloxane block copolymer         from step I) to crosslink the trisiloxy units of the         resin-linear organosiloxane block copolymer sufficiently to         increase the average molecular weight (M_(w)) of the         resin-linear organosiloxane block copolymer by at least 50%,

    -   III) optionally, further processing the resin-linear         organosiloxane block copolymer to enhance storage stability         and/or optical clarity,

    -   IV) optionally, removing the organic solvent.

The first step in the present process involves reacting;

-   -   a) a linear organosiloxane having the formula

R¹ _(q)(E)_((3-q))SiO(R¹ ₂SiO_(2/2))_(n)Si(E)_((3-q))R¹ _(q),

-   -   -   where each R¹ is independently a C₁ to C₃₀ hydrocarbyl,         -   n is 10 to 400, q is 0, 1, or 2,         -   E is a hydrolyzable group containing at least one carbon             atom, and

    -   b) an organosiloxane resin comprising at least 60 mol % of         [R²SiO_(3/2)] siloxy units in its formula, where each R² is         independently an aryl or C₁ to C₁₀ hydrocarbyl,

    -   in c) an organic solvent

    -   to form a resin-linear organosiloxane block copolymer;         -   wherein the amounts of a) and b) used in step I are selected             to provide the resin-linear organosiloxane block copolymer             with 40 to 90 mol % of disiloxy units [R¹ ₂SiO_(2/2)] and 10             to 60 mol % of trisiloxy units [R²SiO_(3/2)], and

wherein at least 95 weight percent of the linear organosiloxane added in step I is incorporated into the resin-linear organosiloxane block copolymer.

The reaction of the first step of the process may be represented generally according to the following schematic;

The various OH groups on the organosiloxane resin are reacted with the hydrolyzable groups (E) on the linear organosiloxane, to form a resin-linear organosiloxane block copolymer and a H-(E) compound. The reaction in step I may be considered as a condensation reaction between the organosiloxane resin and the linear organosiloxane.

The Linear Organosiloxane

Component a) in step I of the present process is a linear organosiloxane having the formula R¹ _(q)(E)_((3-q))SiO(R¹ ₂SiO_(2/2))_(n)Si(E)_((3-q))R¹ _(q), where each R¹ is independently a C₁ to C₃₀ hydrocarbyl, the subscript “n” may be considered as the degree of polymerization (dp) of the linear organosiloxane and may vary from 10 to 400, the subscript “q” may be 0, 1, or 2, and E is a hydrolyzable group containing at least one carbon atom. While component a) is described as a linear organosiloxane having the formula R¹ _(q)(E)_((3-q))SiO(R¹ ₂SiO_(2/2))_(n)Si(E)_((3-q))R¹ _(q), one skilled in the art recognizes small amount of alternative siloxy units, such a T (R¹SiO_(3/2)) siloxy units, may be incorporated into the linear organosiloxane and still be used as component a). As such the organosiloxane may be considered as being “predominately” linear by having a majority of D (R¹ ₂SiO_(2/2)) siloxy units. Furthermore, the linear organosiloxane used as component a) may be a combination of several linear organosiloxanes.

R¹ in the above linear organosiloxane formula is independently a C₁ to C₃₀ hydrocarbyl. The hydrocarbon group may independently be an alkyl, aryl, or alkylaryl group. R¹ may be a C₁ to C₃₀ alkyl group, alternatively R¹ may be a C₁ to C₁₈ alkyl group. Alternatively R¹ may be a C₁ to C₆ alkyl group such as methyl, ethyl, propyl, butyl, pentyl, or hexyl. Alternatively R¹ may be methyl. R¹ may be an aryl group, such as phenyl, naphthyl, or an anthryl group. Alternatively, R¹ may be any combination of the aforementioned alkyl or aryl groups. Alternatively, R¹ is phenyl, methyl, or a combination of both.

E may be selected from any hydrolyzable group containing at least one carbon atom, but typically E is selected from an oximo, epoxy, carboxy, amino, or amido group. Alternatively, E may have the formula R¹C(═O)O—, R¹ ₂C═N—O—, or R⁴C═N—O— where R¹ is as defined above, and R⁴ is hydrocarbylene. In one embodiment, E is H₃CC(═O)O— (acetoxy) and q is 1. In one embodiment, E is (CH₃)(CH₃CH₂)C═N—O— (methylethylketoxy) and q is 1.

In one embodiment, the linear organosiloxane has the formula (CH₃)_(q)(E)_((3-q))SiO[(CH₃)₂SiO_(2/2))]_(n)Si(E)_((3-q))(CH₃)_(q), where E, n, and q are as defined above.

In one embodiment, the linear organosiloxane has the formula (CH₃)_(q)(E)_((3-q))SiO[(CH₃)(C₆H₅)SiO_(2/2))]_(n)Si(E)_((3-q))(CH₃)_(q), where E, n, and q are as defined above.

Processes for preparing linear organosiloxanes suitable as component a) are known. Typically a silanol ended polydiorganosiloxane is reacted with an “endblocking” compound such as an alkyltriacetoxysilane or a dialkylketoxime. The stoichiometry of the endblocking reaction is typically adjusted such that a sufficient amount of the endblocking compound is added to react with all the silanol groups on the polydiorganosiloxane. Typically, a mole of the endblocking compound is used per mole of silanol on the polydiorganosiloxane. Alternatively, a slight molar excess such as 1 to 10% of the endblocking compound may be used. The reaction is typically conducted under anhydrous conditions to minimize condensation reactions of the silanol polydiorganosiloxane. Typically, the silanol ended polydiorganosiloxane and the endblocking compound are dissolved in an organic solvent under anhydrous conditions, and allowed to react at room temperature, or at elevated temperatures (up to the boiling point of the solvent).

The Organosiloxane Resin

Component b) in the present process is an organosiloxane resin comprising at least 60 mol % of [R²SiO_(3/2)] siloxy units in its formula, where each R² is independently a C₁ to C₂₀ hydrocarbyl. The organosiloxane resin may contain any amount and combination of other M, D, and Q siloxy units, providing the organosiloxane resin contains at least 70 mol % of [R²SiO_(3/2)] siloxy units, alternatively the organosiloxane resin contains at least 80 mol % of [R²SiO_(3/2)] siloxy units, alternatively the organosiloxane resin contains at least 90 mol % of [R²SiO_(3/2)] siloxy units, or alternatively the organosiloxane resin contains at least 95 mol % of [R²SiO_(3/2)] siloxy units. Organosiloxane resins useful as component b) include those known as “silsesquioxane” resins.

Each R² is independently a C₁ to C₂₀ hydrocarbyl. R² may be an aryl group, such as phenyl, naphthyl, anthryl group. Alternatively, R² may be an alkyl group, such as methyl, ethyl, propyl, or butyl. Alternatively, R² may be any combination of the aforementioned alkyl or aryl groups. Alternatively, R² is phenyl or methyl.

The molecular weight (M_(w)) of the organosiloxane resin is not limiting, but typically ranges from 1000 to 10,000, or alternatively 1500 to 5000 g/mol.

One skilled in the art recognizes that organosiloxane resins containing such high amounts of [R²SiO_(3/2)] siloxy units will inherently have a certain concentration of Si—OZ where Z may be hydrogen (i.e. silanol), an alkyl group (so that OZ is an alkoxy group), or alternatively OZ may also be any of the “E” hydrolyzable groups as described above. The Si—OZ content as a mole percentage of all siloxy groups present on the organosiloxane resin may be readily determined by ²⁹Si NMR. The concentration of the OZ groups present on the organosiloxane resin will vary, as dependent on the mode of preparation, and subsequent treatment of the resin. Typically, the silanol (Si—OH) content of organosiloxane resins suitable for use in the present process will have a silanol content of at least 5 mole %, alternatively of at least 10 mole %, alternatively 25 mole %, alternatively 40 mole %, or alternatively 50 mole %.

Organosiloxane resins containing at least 60 mol % of [R²SiO_(3/2)] siloxy units, and methods for preparing them, are known in the art. They are typically prepared by hydrolyzing an organosilane having three hydrolyzable groups on the silicon atom, such as a halogen or alkoxy group in an organic solvent. A representative example for the preparation of a silsesquioxane resin may be found in U.S. Pat. No. 5,075,103. Furthermore, many organosiloxane resins are available commercially and sold either as a solid (flake or powder), or dissolved in an organic solvent. Suitable, non-limiting, commercially available organosiloxane resins useful as component b) include; Dow Corning® 217 Flake Resin, 233 Flake, 220 Flake, 249 Flake, 255 Flake, Z-6018 Flake (Dow Corning Corporation, Midland Mich.).

One skilled in the art further recognizes that organosiloxane resins containing such high amounts of [R²SiO_(3/2)] siloxy units and silanol contents may also retain water molecules, especially in high humidity conditions. Thus, it is often beneficial to remove excess water present on the resin by “drying” the organosiloxane resin prior to reacting in step I. This may be achieved by dissolving the organosiloxane resin in an organic solvent, heating to reflux, and removing water by separation techniques (for example Dean Stark trap or equivalent process).

The amounts of a) and b) used in the reaction of step I are selected to provide the resin-linear organosiloxane block copolymer with 40 to 90 mol % of disiloxy units [R¹ ₂SiO_(2/2)] and 10 to 60 mol % of trisiloxy units [R²SiO_(3/2)]. The mol % of dilsiloxy and trisiloxy units present in components a) and b) may be readily determined using ²⁹Si NMR techniques. The starting mol % then determines the mass amounts of components a) and b) used in step I.

The amount of components a) and b) selected should also ensure there is a molar excess of the silanol groups on the organosiloxane resin vs amount of linear organosiloxane added. Thus, a sufficient amount of the organosiloxane resin should be added to potentially react with all the linear organosiloxane added in step I). As such, a molar excess of the organosiloxane resin is used. The amounts used may be determined by accounting for the moles of the organosiloxane resin used per mole of the linear organosiloxane. To illustrate a typical calculation, the amounts of components a) and b) as used in Example 3 below are detailed. In example 3, 28 wt % Dow Corning® 217 flake resin with number average molecular weight of about 1,200 g/mol (Mn) was used and 72 wt % silanol terminated PDMS (Gelest DMS-S27) was used with Mn around 13,500 g/mol. When Dow Corning® 217 flake is used in a copolymer, a ratio of 4.38 resin molecules to PDMS molecules [(28/1200)/(72/13500)] is obtained and as such provides an excess of resin molecules to react all PDMS molecules into the copolymer.

As discussed above, the reaction affected in step I is a condensation reaction between the hydrolyzable groups of linear organosiloxane with the silanol groups on the organosiloxane resin. A sufficient amount of silanol groups needs to remain on the resin component of the formed resin-linear organosiloxane copolymer to further react in step II of the present process. Typically, at least 10 mole %, alternatively at least 20 mole %, or alternatively at least 30 mole % silanol should remain on the trisiloxy units of the resin-linear organosiloxane copolymer as produced in step I of the present process.

The reaction conditions for reacting the aforementioned (a) linear organosiloxane with the (b) organosiloxane resin are not particularly limited. Typically, reaction conditions are selected to affect a condensation type reaction between the a) linear organosiloxane and b) organosiloxane resin. Various non-limiting embodiments and reaction conditions are described in the Examples below. In some embodiments, the (a) linear organosiloxane and the (b) organosiloxane resin are reacted at room temperature. In other embodiments, (a) and (b) are reacted at temperatures that exceed room temperature and that range up to about 50, 75, 100, or even up to 150° C. Alternatively, (a) and (b) can be reacted together at reflux of the solvent. In still other embodiments, (a) and (b) are reacted at temperatures that are below room temperature by 5, 10, or even more than 10° C. In still other embodiments (a) and (b) react for times of 1, 5, 10, 30, 60, 120, or 180 minutes, or even longer. Typically, (a) and (b) are reacted under an inert atmosphere, such as nitrogen or a noble gas. Alternatively, (a) and (b) may be reacted under an atmosphere that includes some water vapor and/or oxygen. Moreover, (a) and (b) may be reacted in any size vessel and using any equipment including mixers, vortexers, stirrers, heaters, etc. In other embodiments, (a) and (b) are reacted in one or more organic solvents which may be polar or non-polar. Typically, aromatic solvents such as toluene, xylene, benzene, and the like are utilized. The amount of the organosiloxane resin dissolved in the organic solvent may vary, but typically the amount should be selected to minimize the chain extension of the linear organosiloxane or pre-mature condensation of the organosiloxane resin.

The order of addition of components a) and b) may vary, but typically the linear organosiloxane is added to a solution of the organosiloxane resin dissolved in the organic solvent. This order of addition is believed to enhance the condensation of the hydrolyzable groups on the linear organosiloxane with the silanol groups on organosiloxane resin, while minimizing chain extension of the linear organosiloxane or pre-mature condensation of the organosiloxane resin.

The progress of the reaction in step I, and the formation of the resin-linear organosiloxane block copolymer, may be monitored by various analytical techniques, such as GPC, IR, or ²⁹Si NMR. Typically, the reaction in step I is allowed to continue until at least 95 weight percent of the linear organosiloxane added in step I is incorporated into the resin-linear organosiloxane block copolymer.

The second step of the present process involves further reacting the resin-linear organosiloxane block copolymer from step I) to crosslink the trisiloxy units of the resin-linear organosiloxane block copolymer to increase the molecular weight of the resin-linear organosiloxane block copolymer by at least 50%, alternatively by at least 60%, alternatively by 70%, alternatively by at least 80%, alternatively by at least 90%, or alternatively by at least 100%.

The reaction of the second step of the process may be represented generally according to the following schematic;

The inventors believe the reaction of step II crosslinks the trisiloxy blocks of the resin-linear organosiloxane block copolymer formed in step I, which will increase the average molecular weight of the block copolymer. The inventors also believe the crosslinking of the trisiloxy blocks provides the block copolymer with an aggregated concentration of trisiloxy blocks, which ultimately may help to form “nano-domains” in solid compositions of the block copolymer. In other words, this aggregated concentration of trisiloxy blocks may phase separate when the block copolymer is isolated in a solid form such as a film or cured coating. The aggregated concentration of trisiloxy block within the block copolymer and subsequent formation of “nano-domains” in the solid compositions containing the block copolymer, may provide for enhanced optical clarity of these compositions as well as the other physical property benefits associated with these materials.

The crosslinking reaction in Step II may be accomplished via a variety of chemical mechanisms and/or moieties. For example, crosslinking of non-linear blocks within the block copolymer may result from the condensation of residual silanol groups present in the non-linear blocks of the copolymer. Crosslinking of the non-linear blocks within the block copolymer may also occur between “free resin” components and the non-linear blocks. “Free resin” components may be present in the block copolymer compositions as a result of using an excess amount of an organosiloxane resin in step I of the preparation of the block copolymer. The free resin component may crosslink with the non-linear blocks by condensation of the residual silanol groups present on the non-linear blocks and on the free resin. The free resin may provide crosslinking by reacting with lower molecular weight compounds added as crosslinkers, as described below.

Step II of the present process may occur simultaneous upon formation of the resin-linear organosiloxane of step I, or involve a separate reaction in which conditions have been modified to affect the step II reaction. The step II reaction may occur in the same conditions as step I. In this situation, the step II reaction proceeds as the resin-linear organosiloxane copolymer is formed. Alternatively, the reaction conditions used for step I) are extended to further the step II reaction. Alternatively, the reaction conditions may be changed, or additional ingredients added to affect the step II reaction.

The present inventors have discovered that the step II reaction conditions may depend on the selection of the hydrolyzable group (E) used in the starting linear organosiloxane. When (E) in the linear organosiloxane is an oxime group, it is possible for the step II reaction to occur under the same reaction conditions as step I. That is, as the linear-resin organosiloxane copolymer is formed in step I, it will continue to react via condensation of the silanol groups present on the resin component to further increase the molecular weight of the resin-linear organosiloxane copolymer. Not wishing to be bound by any theory, the present inventors believe that when (E) is an oximo group, the hydrolyzed oximo group (for example methyl ethylketoxime) resulting from the reaction in step I may act as a condensation catalyst for the step II reaction. As such, the step II reaction may proceed simultaneously under the same conditions for step I. In other words, as the resin-linear organosiloxane copolymer is formed in step I, it may further react under the same reaction conditions to further increase its molecular weight via a condensation reaction of the silanol groups present on the resin component of the copolymer. However, when (E) on the linear organosiloxane is an acetoxy group, the resulting hydrolyzed group (acetic acid), does not sufficiently catalyze the step II) reaction. Thus, in this situation the step II reaction may be enhanced with a further component to affect condensation of the resin components of the resin-linear organosiloxane copolymer, as described in the embodiment below.

In one embodiment of the present process, an organosilane having the formula R⁵ _(q)SiX_(4-q) is added during step II), where R⁵ is a C₁ to C₈ hydrocarbyl or a C₁ to C₈ halogen-substituted hydrocarbyl, X is a hydrolysable group, and q is 0, 1, or 2. R⁵ is a C₁ to C₈ hydrocarbyl or a C₁ to C₈ halogen-substituted hydrocarbyl, or alternatively R⁵ is a C₁ to C₈ alkyl group, or alternatively a phenyl group, or alternatively R⁵ is methyl, ethyl, or a combination of methyl and ethyl. X is any hydrolyzable group, alternatively X may be E, as defined above, a halogen atom, hydroxyl (OH), or an alkoxy group. In one embodiment, the organosilane is an alkyltriacetoxysilane, such as methyltriacetoxysilane, ethyltriacetoxysilane, or a combination of both. Commercially available representative alkyltriacetoxysilanes include ETS-900 (Dow Corning Corp., Midland, Mich.). Other suitable, non-limiting organosilanes useful in this embodiment include; methyl-tris(methylethylketoxime)silane (MTO), methyl triacetoxysilane, ethyl triacetoxysilane, tetraacetoxysilane, tetraoximesilane, dimethyl diacetoxysilane, dimethyl dioximesilane, methyl tris(methylmethylketoxime)silane.

The amount of organosilane having the formula R⁵ _(q)SiX_(4-q) when added during step II) varies, but should be based on the amount of organosiloxane resin used in the process. The amount of silane used should provide a molar stoichiometry of 2 to 15 mol % of organosilane/mols of Si on the organosiloxane resin. Furthermore, the amount of the organosilane having the formula R⁵ _(q)SiX_(4-q) added during step II) is controlled to ensure a stoichiometry that does not consume all the silanol groups on the organosiloxane block copolymer. In one embodiment, the amount of the organosilane added in step II is selected to provide an organosiloxane block copolymer containing 0.5 to 35 mole percent of silanol groups [≡SiOH].

Step III in the present process is optional, and involves further processing the resin-linear organosiloxane block copolymer to enhance storage stability and/or optical clarity. As used herein the phrase “further processing” refers to any further reaction or treatment of the formed resin-linear organosiloxane copolymer to enhance its storage stability, and/or optical clarity. The resin-linear organosiloxane copolymer as produced in step II may still contain a significant amount of reactive “OZ” groups (that is ≡SiOZ groups, where Z is as defined above), and/or X groups (where X is introduced into the block copolymer when the organosilane having the formula R⁵ _(q)SiX_(4-q) is used in step II). The OZ groups present on the resin-linear organosiloxane copolymer at this stage may be silanol groups that were originally present on the resin component, or alternatively may result from the reaction of the organosilane having the formula R⁵ _(q)SiX_(4-q) with silanol groups, when the organosilane is used in step II. The present inventors believe such “OZ” or X groups may further react during storage, limiting shelf stability, or diminishing reactivity of the resin-linear organosiloxane copolymer during end-use applications. Alternatively, further reaction of residual silanol groups may further enhance the formation of the resin domains and improve the optical clarity of the resin-linear organosiloxane copolymer. Thus, optional step III may be performed to further react OZ or X present on the organosiloxane block copolymer produced in Step II to improve storage stability and/or optical clarity. The conditions for step III may vary, depending on the selection of the linear and resin components, their amounts, and the endcapping compounds used. Certain embodiments are described below.

In one embodiment of the process, step III is performed by reacting the resin-linear organosiloxane from step II with water and removing any small molecular compounds formed in the process such as acetic acid. In this embodiment, the resin-linear organosiloxane copolymer is typically produced from a linear organosiloxane where E is an acetoxy group, and/or an acetoxy silane is used in step II. Although not wishing to be bound by any theory, the present inventors believe in this embodiment, the resin-linear organosiloxane formed in step II contains a significant quantity of hydrolyzable Si—O—C(O)CH₃ groups, which may limit the storage stability of the resin-linear organosiloxane copolymer. Thus, water may be added to the resin-linear organosiloxane copolymer formed from step II, which will hydrolyze most Si—O—C(O)CH₃ groups to further link the trisiloxy units, and eliminate acetic acid. The formed acetic acid, and any excess water, may be removed by known separation techniques. The amount of water added in this embodiment may vary, but typically 10 weight %, or alternatively 5 weight % is added per total solids (as based on resin-linear organosiloxane copolymer in the reaction medium).

In one embodiment of the process, step III is performed by reacting the resin-linear organosiloxane from step II with an endcapping compound selected from an alcohol, oxime, or trialkylsiloxy compound. In this embodiment, the resin-linear organosiloxane copolymer is typically produced from a linear organosiloxane where E is an oxime group. The endcapping compound may be a C₁-C₂₀ alcohol such as methanol, ethanol, propanol, butanol, or others in the series. Alternatively, the alcohol is n-butanol. The endcapping compound may also be a trialkylsiloxy compound, such as trimethylmethoxysilane or trimethylethoxysilane. The amount of endcapping compound may vary but typically is between 3 and 15 wt % with respect to the resin linear organosiloxane block copolymer solids in the reaction medium.

Step IV of the present process is optional, and involves removing the organic solvent used in the reactions of steps I and II. The organic solvent may be removed by any known techniques, but typically involves heating the resin-linear organosiloxane copolymer compositions at elevated temperature, either at atmospheric conditions or under reduced pressures.

The present disclosure further relates to the resin-linear organosiloxane copolymer composition prepared by any of the aforementioned processes, and subsequently formed solid compositions derived from these compositions.

Solid compositions containing the resin-linear organosiloxane block copolymers may be prepared by removing the solvent from the organosiloxane block copolymer compositions as described above. The solvent may be removed by any known processing techniques. In one embodiment, a film of the curable compositions containing the organosiloxane block copolymers is formed, and the solvent is allowed to evaporate from the film. Subjecting the films to elevated temperatures, and/or reduced pressures, will accelerate solvent removal and subsequent formation of the solid curable composition. Alternatively, the curable compositions may be passed through an extruder to remove solvent and provide the solid composition in the form of a ribbon or pellets. Coating operations against a release film could also be used as in slot die coating, knife over roll, rod, or gravure coating. Also, roll-to-roll coating operations could be used to prepare a solid film. In coating operations, a conveyer oven or other means of heating and evacuating the solution can be used to drive off the solvent and obtain the final solid film.

Although not wishing to be bound by any theory, the inventors believe the structural ordering of the disiloxy and trisiloxy units in the organosiloxane block copolymer as described above may provide the copolymer with certain unique physical property characteristics when solid compositions of the block copolymer are formed. For example, the structural ordering of the disiloxy and trisiloxy units in the copolymer may provide solid coatings that allow for a high optical transmittance of visible light. The structural ordering may also allow the organosiloxane block copolymer to flow and cure upon heating, yet remain stable at room temperature. They may also be processed using lamination techniques. These properties are useful to provide coatings for various electronic articles to improve weather resistance and durability, while providing low cost and easy procedures that are energy efficient.

The present disclosure further relates to solid forms of the aforementioned organosiloxane block copolymers and solid compositions derived from the curable compositions described above comprising the organosiloxane block copolymers.

The aforementioned organosiloxane block copolymers are isolated in a solid form, for example by casting films of a solution of the block copolymer in an organic solvent and allowing the solvent to evaporate. Upon drying or forming a solid, the non-linear blocks of the block copolymer further aggregate together to form “nano-domains”. As used herein, “predominately aggregated” means the majority of the non-linear blocks of the organosiloxane block copolymer are found in certain regions of the solid composition, described herein as “nano-domains”. As used herein, “nano-domains” refers to those phase regions within the solid block copolymer compositions that are phase separated within the solid block copolymer compositions and possess at least one dimension sized from 1 to 100 nanometers. The nano-domains may vary in shape, providing at least one dimension of the nano-domain is sized from 1 to 100 nanometers. Thus, the nano-domains may be regular or irregularly shaped. The nano-domains may be spherically shaped, tubular shaped, and in some instances lamellar shaped.

In a further embodiment, the solid organosiloxane block copolymers as described above contain a first phase and an incompatible second phase, the first phase containing predominately the disiloxy units [R¹ ₂SiO_(2/2)] as defined above, the second phase containing predominately the trisiloxy units [R²SiO_(3/2)] as defined above, the non-linear blocks being sufficiently aggregated into nano-domains which are incompatible with the first phase.

When solid compositions are formed from the curable compositions of the organosiloxane block copolymer which also contain an organosiloxane resin, as described above, the organosiloxane resin also predominately aggregates within the nano-domains.

The structural ordering of the disiloxy and trisiloxy units in the solid block copolymers of the present disclosure, and characterization of the nano-domains, may be determined explicitly using certain analytical techniques such as Transmission Electron Microscopic (TEM) techniques, Atomic Force Microscopy (AFM), Small Angle Neutron Scattering, Small Angle X-Ray Scattering, and Scanning Electron Microscopy. An AFM image of a solid coating containing a representative organosiloxane block copolymer (Example 3) is shown in FIG. 1. This image was obtained using a tapping mode showing the phase angle. The lighter areas correspond to the nano-domains containing the non-linear blocks, whereas the darker areas correspond to the linear block rich phase.

Alternatively, the structural ordering of the disiloxy and trisiloxy units in the block copolymer, and formation of nano-domains, may be implied by characterizing certain physical properties of coatings resulting from the present organosiloxane block copolymers. For example, the present organosiloxane copolymers may provide coatings that have an optical transmittance of visible light greater than 95%. One skilled in the art recognizes that such optical clarity is possible (other than refractive index matching of the two phases) only when visible light is able to pass through such a medium and not be diffracted by particles (or domains as used herein) having a size greater than 150 nanometers. As the particle size, or domains further decreases, the optical clarity may be further improved. Thus, coatings derived from the present organosiloxane copolymers may have an optical transmittance of visible light at least 95%.

In some aspects, the present resin-linear organosiloxane block copolymers may conceptually be compared to organic thermoplastics elastomers (TPEs). TPEs possess phase segregated “soft” and “hard” polymeric blocks. The solid compositions containing the present resin-linear organopolysiloxanes block copolymers may be viewed as containing phase separated “soft” and “hard” segments resulting from the block of linear D units and aggregates of blocks of non-linear T units respectively. These respective soft and hard segments may be characterized by their differing glass transition temperatures (T_(g)). Thus the linear segments of the resin-linear organosiloxanes may be consider a “soft” segment by typically having a low T_(g), for example less than 25° C., alternatively less than 0° C., or alternatively even less than −20° C. Thus, the linear segments will attempt to maintain their “fluid” like behavior in resulting compositions of the organosiloxane block copolymer. Conversely, the non-linear blocks within the organosiloxane copolymer may be likened to “hard segments” by typically having higher T_(g), values, for example greater than 30° C., alternatively greater than 40° C., or alternatively even greater than 50° C.

The advantage of the present resin-linear organopolysiloxanes block copolymers is that they can be processed several times providing the processing temperature (T_(processing)) is less than the temperature required to finally cure (T_(cure)) the organosiloxane block copolymer, i.e. if T_(processing)<T_(cure). However the organosiloxane copolymer will cure and achieve high temperature stability when T_(processing)>T_(cure). Thus, the present resin linear organopolysiloxanes block copolymers offer the significant advantage of being “re-processable” in conjunction with the benefits typically associated with silicones, such as; hydrophobicity, high temperature stability, moisture/UV resistance.

In one embodiment, the solid compositions of the organosiloxane block copolymers may be considered as “melt processable”. In this embodiment, the solid compositions, such as a coating formed from a film of a solution containing the organosiloxane block copolymers, exhibit fluid behavior at elevated temperatures, that is upon “melting”. The “melt processable” features of the solid compositions of the organosiloxane block copolymers may be monitored by measuring the “melt flow temperature” of the solid compositions, that is when the solid composition demonstrates liquid behavior. The melt flow temperature may specifically be determined by measuring the storage modulus (G′), loss modulus (G″) and tan delta as a function of temperature storage using commercially available instruments. For example, a commercial rheometer (such as TA Instruments' ARES-RDA—with 2KSTD standard flexular pivot spring transducer, with forced convection oven) may be used to measure the storage modulus (G′), loss modulus (G″) and tan delta as a function of temperature. Test specimens (typically 8 mm wide, 1 mm thick) may be loaded in between parallel plates and measured using small strain oscillatory rheology while ramping the temperature in a range from 25° C. to 300° C. at 2° C./min (frequency 1 Hz). A typical rheology curve on an organosiloxane copolymer is shown in FIG. 2. The flow onset may be calculated as the inflection temperature in the G′ drop (labeled FLOW), the viscosity at 120° C. is reported as a measure for melt processability and the cure onset is calculated as the onset temperature in the G′ rise (labeled CURE). Typically, the FLOW of the solid compositions will also correlate to the glass transition temperature of the non-linear segments (i.e. the resin component) in the organosiloxane block copolymer.

In a further embodiment, the solid compositions may be characterized as having a melt flow temperature ranging from 25° C. to 200° C., alternatively from 25° C. to 160° C., or alternatively from 50° C. to 160° C.

The present inventors believe the melt processability benefits enables the reflow of solid compositions of the organosiloxane block copolymers around device architectures, after an initial coating or solid is formed on the device. This feature is very beneficial to encapsulated various electronic devices.

In one embodiment, the solid compositions of the organosiloxane block copolymers may be considered as “curable”. In this embodiment, the solid compositions, such as a coating formed from a film of a solution containing the organosiloxane block copolymers, may undergo further physical property changes by further curing the block copolymer. As discussed above, the present organosiloxane block copolymers contain a certain amount of silanol groups. The inventors believe the presence of these silanol groups on the block copolymer permit further reactivity, i.e. a cure mechanism. Upon curing, the physical properties of solid compositions may be further altered, as discussed in certain embodiments below.

Alternatively, the “melt processability” and/or cure of the solid compositions of the organosiloxane block copolymers may be determined by rheological measurements at various temperatures.

The solid compositions containing the organosiloxane block copolymers may have a storage modulus (G′) at 25° C. ranging from 0.01 MPa to 500 MPa and a loss modulus (G″) ranging from 0.001 MPa to 250 MPa, alternatively a storage modulus (G′) at 25° C. ranging from 0.1 MPa to 250 MPa and a loss modulus (G″) ranging from 0.01 MPa to 125 MPa, alternatively a storage modulus (G′) at 25° C. ranging from 0.1 MPa to 200 MPa and a loss modulus (G″) ranging from 0.01 MPa to 100 MPa.

The solid compositions containing the organosiloxane block copolymers may have a storage modulus (G′) at 120° C. ranging from 10 Pa to 500,000 Pa and a loss modulus (G″) ranging from 10 Pa to 500,00 Pa, alternatively a storage modulus (G′) at 120° C. ranging from 20 Pa to 250,000 Pa and a loss modulus (G″) ranging from 20 Pa to 250,000 Pa, alternatively a storage modulus (G′) at 120° C. ranging from 30 Pa to 200,000 Pa and a loss modulus (G″) ranging from 30 Pa to 200,000 Pa.

The solid compositions containing the organosiloxane block copolymers may have a storage modulus (G′) at 200° C. ranging from 10 Pa to 100,000 Pa and a loss modulus (G″) ranging from 5 Pa to 80,00 Pa, alternatively a storage modulus (G′) at 200° C. ranging from 20 Pa to 75,000 Pa and a loss modulus (G″) ranging from 10 Pa to 65,000 Pa, alternatively a storage modulus (G′) at 200° C. ranging from 30 Pa to 50,000 Pa and a loss modulus (G″) ranging from 15 Pa to 40,000 Pa.

EXAMPLES

The following examples are included to demonstrate preferred embodiments of the invention. It should be appreciated by those of skill in the art that the techniques disclosed in the examples which follow represent techniques discovered by the inventor to function well in the practice of the invention, and thus can be considered to constitute preferred modes for its practice. However, those of skill in the art should, in light of the present disclosure, appreciate that many changes can be made in the specific embodiments which are disclosed and still obtain a like or similar result without departing from the spirit and scope of the invention. All percentages are in wt. %. All measurements were conducted at 23° C. unless indicated otherwise.

Characterization Techniques ²⁹Si and ¹³C NMR Spectrometry

NMR samples of resin linear products were prepared by weighing ˜3 grams of solvent free resin linear (prepared by drying sample overnight at room temperature), 1 g of CDCl₃, and 4 grams of 0.04M Cr(acac)₃ solution in CDCl₃ into a vial and mixing thoroughly. Samples were then transferred into a silicon-free NMR tube. Spectra were acquired using a Varian Mercury 400 MHz NMR. NMR samples of other materials such as 217 Flake and silanol terminated PDMS were prepared by diluting 4 g of sample into 4 grams of 0.04M Cr(acac)₃ solution in CDCl₃.

¹³C NMR experiments were performed in the following manner. Samples were placed into 16 mm glass NMR tubes. A 5 mm NMR tube was placed inside the 16 mm tube and filled with lock solvent. 13C DEPT NMR was acquired in 12 or 20 minute signal averaging blocks. Data was acquired on a Varian Inova NMR spectrometer with a 1H operational frequency of 400 MHz.

Silanol content of resin linear products was calculated from the integration values of the T(Ph,OZ) and T(Ph,OZ2) regions in the 29Si NMR spectrum. T(Alkyl) groups were considered fully condensed (assumption) and subtracted from the T(Ph,OZ) region. The T(Alkyl) content was calculated by multiplying the integration value of D(Me₂) from ²⁹Si NMR by the fraction (mols Si of coupling agent/mols Si of PDMS used in the synthesis formulation). Isopropoxy from 217 Flake was not subtracted out of the OZ values due to its low concentration. Therefore it was assumed that total OZ=total OH.

GPC Analysis

Samples were prepared in certified THF at 0.5% w/v concentration, filtered with a 0.45 um PTFE syringe filter, and analyzed against polystyrene standards. The relative calibration (3^(rd) order fit) used for molecular weight determination was based on 16 polystyrene standards ranging in molecular weights from 580 to 2,320,000 Daltons. The chromatographic equipment consisted of a Waters 2695 Separations Module equipped with a vacuum degasser, a Waters 2410 differential refractometer and two (300 mm×7.5 mm) Polymer Laboratories Mixed C columns (molecular weight separation range of 200 to 3,000,000) preceded by a guard column. The separation was performed using certified grade THF programmed to flow at 1.0 mL/min., injection volume was set at 100 μL and columns and detector were heated to 35° C. Data collection was 25 minutes and processing was performed using Atlas/Cirrus software.

To determine free resin content, the free resin peak at lower molecular weight was integrated to get the area percent.

Rheology Analysis

A commercially available rheometer from TA Instruments (ARES-RDA with 2KSTD standard flexular pivot spring transducer, TA Instruments, New Castle, Del. 19720) with forced convection oven was used to measure the storage modulus (G′), loss modulus (G″) and tan delta as a function of temperature. Test specimens (typically 8 mm wide, 1 mm thick) were loaded in between parallel plates and measured using small strain oscillatory rheology while ramping the temperature in a range from 25° C. to 300° C. at 2° C./min (frequency 1 Hz).

To characterize the copolymers, the flow onset was calculated as the inflection temperature in the G′ drop (labeled FLOW), the viscosity at 120° C. will be reported as a measure for melt processability and the cure onset was calculated as the inflection temperature in the G′ rise (labeled CURE).

A typical rheology curve on an organosiloxane copolymer is shown in FIG. 1. The results of the rheological evaluations of the representative examples disclosed herein, are summarized further below in Table 1.

Optical Clarity

Optical clarity was evaluated as the % transmission of light at wavelengths from about 350-1000 nanometers, measured through 1 mm thick samples of cast sheets of the present compositions. Generally, samples having a % transmittance of at least 95% were considered to be optically clear.

Example 1 (Reference) Oxime-Capping of Silanol Ended PDMS, Procedure for a 1.05/1 Ratio of MTO/SiOH

A solution of toluene (60.0 g) and 184 dp silanol terminated polydimethylsiloxane or PDMS (43.07 g, 0.580 mols Si, Dow Corning SFD 750) was capped with methyltris(methylethylketoxime)silane, MTO (2.0 g, 0.00663 mols, Gelest). It was prepared in a glove box (same day) under nitrogen by adding MTO to the silanol terminated PDMS and mixing at room temperature for 2 hours.

Example 2 (Reference) Acetoxy-Capping of Silanol Ended PDMS (1.05/1 Ratio of ETS900/SiOH)

A solution of toluene (80.0 g) and 184 dp silanol terminated PDMS (Gelest DMS-S27, 43.2 g, 0.58 μmols Si) was capped with alkyltriacetoxysilane (Dow Corning ETS-900, 4.54 g, 0.0195 mols Si). It was prepared in a glove box (same day) under nitrogen by adding the ETS-900 to the silanol terminated PDMS and mixing at room temperature for 2 hours.

Example 3 Resin-Linear Using Acetoxy Terminated PDMS Based on 184 dp PDMS Composition: (Me₂SiO_(2/2))_(0.83)(PhSiO_(3/2))_(0.16) (28 wt % Phenyl-T)

A 5 L 4neck round bottom flask was loaded with a phenylsilsesquioxane hydrolyzate (Dow Corning 217 Flake, 280.0 g, 2.050 mols Si) and toluene (Fisher Scientific, 1000.0 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied. The Dean Stark was prefilled with toluene. An oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PDMS was added. The diacetoxy terminated PDMS was made according to example 2 using toluene (500.0 g), 184 dp silanol terminated PDMS (Gelest DMS-S27, 720.0 g, 9.690 mols Si), and 50/50 distilled MTA/ETA (23.77 g, 0.1028 mols Si). The diacetoxy terminated PDMS was added quickly to the phenylsilsesquioxane hydrolyzate solution at 108° C. The reaction mixture was heated at reflux for 3 hrs 15 min. At this stage 50/50 distilled MTA/ETA (22.78 g, 0.0984 mols Si) was added and the mixture was refluxed for 1 hr. Deionized water (36.2 g) was added and then the reaction mixture was heated at reflux for 1 hr with no removal of water. Water was then removed through azeotropic distillation using a Dean Stark apparatus. After the bulk of the water was removed (˜109° C.) heating was continued for 2 hrs. Cast sheets (made by pouring the solution in a chase and evaporating the solvent overnight at room temperature) were optically clear. The resulting sheet was a grabby elastomer at room temperature.

Product Mw=237,000 (excludes free resin), OZ=6.31 mol %

Example 4 Resin-Linear Using Acetoxy Terminated PDMS Composition: (Me₂SiO_(2/2))_(0.79)(PhSiO_(3/2))_(0.19) (32 wt % Phenyl-T) based on 184 dp PDMS

A 1 L 3neck round bottom flask was loaded with a phenylsilsesquioxane hydrolyzate (Dow Corning 217 Flake, 51.2 g, 0.374 mols Si) and toluene (Fisher Scientific, 160.0 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied. The Dean Stark was prefilled with toluene. An oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PDMS was added. The diacetoxy terminated PDMS was made according to example 2 using toluene (76.11 g), 184 dp silanol terminated PDMS (Gelest DMS-S27, 108.8 g, 1.46 mols Si), and a 50 wt % solution of ETS-900 in toluene (Dow Corning, 7.79 g, 0.0168 mols Si). The diacetoxy terminated PDMS was added quickly to the phenylsilsesquioxane hydrolyzate solution at 108° C. The reaction mixture was heated at reflux for 2 hrs. At this stage a 50 wt % solution of ETS-900 in toluene (Dow Corning, 12.6 g, 0.027 μmols Si) was added and the mixture was refluxed for 1 hr. Deionized water (30 mL) was added and the aqueous phase removed through azeotropic distillation using a Dean Stark apparatus. This procedure was repeated 2 more times to reduce the acetic acid concentration. Cast sheets (made by pouring the solution in a chase and evaporating the solvent overnight at room temperature) were optically clear. The resulting sheet was a grabby elastomer at room temperature.

Product Mw=144,000 (excludes free resin), OZ=6.56 mol %

Example 5 Resin-Linear Using Acetoxy Terminated PDMS Composition: (Me₂SiO_(2/2))_(0.75)(PhSiO_(3/2))_(0.22) (36 wt % Phenyl-T) based on 184 dp PDMS

A 1 L 3neck round bottom flask was loaded with a phenylsilsesquioxane hydrolyzate (Dow Corning 217 Flake, 64.8 g, 0.473 mols Si) and toluene (Fisher Scientific, 180.0 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied. The Dean Stark was prefilled with toluene. An oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PDMS was added. The diacetoxy terminated PDMS was made according to example 2 using toluene (85.88 g), 184 dp silanol terminated PDMS (Gelest DMS-S27, 115.2 g, 1.55 mols Si), and a 50 wt % solution of ETS-900 in toluene (Dow Corning, 8.25 g, 0.0177 mols Si). The diacetoxy terminated PDMS was added quickly to the phenylsilsesquioxane hydrolyzate solution at 108° C. The reaction mixture was heated at reflux for 2 hrs. At this stage a 50 wt % solution of ETS-900 in toluene (Dow Corning, 18.17 g, 0.0391 mols Si) was added and the mixture was refluxed for 1 hr. Deionized water (30 mL) was added and the aqueous phase removed through azeotropic distillation using a Dean Stark apparatus. This procedure was repeated 2 more times to reduce the acetic acid concentration. Cast sheets (made by pouring the solution in a chase and evaporating the solvent overnight at room temperature) were optically clear. The resulting sheet was a grabby elastomer at room temperature.

Product Mw=169,000 (excludes free resin), OZ=7.71 mol %

Example 6 Resin-Linear Using Acetoxy Terminated PDMS Composition: (Me₂SiO_(2/2))_(0.72)(PhSiO_(3/2))_(0.26) (40 wt % Phenyl-T) based on 184 dp PDMS

A 1 L 3neck round bottom flask was loaded with a phenylsilsesquioxane hydrolyzate (Dow Corning 217 Flake, 64.0 g, 0.467 mols Si) and toluene (Fisher Scientific, 201.1 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied. The Dean Stark was prefilled with toluene. An oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PDMS was added. The diacetoxy terminated PDMS was made according to example 2 using toluene (96.0 g), 184 dp silanol terminated PDMS (Gelest DMS-S27, 96.0 g, 1.29 mols Si), and ETS-900 (Dow Corning, 3.44 g, 0.0148 mols). The diacetoxy terminated PDMS was added quickly to the phenylsilsesquioxane hydrolyzate solution at 108° C. The reaction mixture was heated at reflux for 2 hrs. At this stage alkyltriacetoxysilane (Dow Corning ETS-900, 7.28 g, 0.0313 mols Si) was added and the mixture was refluxed for 1.5 hrs. Deionized water (30 mL) was added and aqueous phase removed through azeotropic distillation using a Dean Stark apparatus. Cast sheet had a light haze so more alkyltriacetoxysilane (1.93 g, 0.00830 mols Si) was added and then the mixture was heated at reflux for 1 hr. Deionized water (30 mL) was added and aqueous phase removed through azeotropic distillation using a Dean Stark apparatus. This step was repeated 2 more times to reduce the acetic acid concentration. The resulting sheet was an optically clear smooth elastomer at room temperature.

Product Mw=148,000 (excludes free resin), OZ=8.80 mol %

Example 7 Formation of Organosiloxane Block Copolymer Using Oxime Terminated PDMS

An organosiloxane block copolymer was formed using oxime terminated PDMS and has approximately 21 mol % of Phenyl-T units which corresponds to about 34 wt % of Phenyl-T units. More specifically, a 500 mL 3-neck round bottom flask was loaded with a phenylsilsesquioxane hydrolyzate (Dow Corning 217 Flake, 20.4, 0.149 mol Si) and toluene (Fisher Scientific, 61.2 g) to form a mixture. The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus pre-filled with toluene and attached to a water-cooled condenser. A nitrogen blanket was then applied. An oil bath was used for heating.

The mixture was heated at reflux for 30 min and subsequently cooled to 100° C. At this point, a solution of oxime capped PDMS, formed using the method described above, was added. More specifically, the oxime capped PDMS was formed using 78.8 g toluene, 39.6 g silanol terminated PDMS, Gelest DMS-S27 184 dp and 1.84 g MTO from Gelest. The oxime-PDMS was added quickly to the phenylsilsesquioxane hydrolyzate at 100° C., heated at reflux for 2.5 hrs after which n-butanol (6 g, Fisher Scientific) was added and further heated at reflux for another 3 hrs. At this point, some volatiles are then removed by distillation to increase a solids content to about 40 wt %. Subsequently, the mixture was cooled to room temperature. The organosiloxane block copolymer formed herein was optically clear and colorless. Cast sheets are then formed by pouring the organosiloxane block copolymer onto a flat surface and evaporating the solvent overnight at room temperature. The cast sheets appear optically clear as well. After formation, the organosiloxane block copolymer of this example was analyzed by ²⁹Si NMR which confirms a structure of (Me₂SiO_(2/2))_(0.783)(MeSiO_(3/2))_(0.009)(PhSiO_(3/2))_(0.208) with 7.52 mol % OR³, wherein R³ is as described above.

Example 8 Formation of Organosiloxane Block Copolymer Using Oxime Terminated PDMS

An organosiloxane block copolymer was formed using oxime terminated PDMS and has approximately 34 mol % of Phenyl-T units which corresponds to about 48 wt % of Phenyl-T units. More specifically, a 1 L 3-neck round bottom flask was loaded with a phenylsilsesquioxane hydrolyzate (Dow Corning 217 Flake, 57.6 g, 0.420 mol Si) and toluene (Fisher Scientific, 175.0 g) to form a mixture. The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus pre-filled with toluene and attached to a water-cooled condenser. A nitrogen blanket was then applied. An oil bath was used for heating.

The mixture was heated at reflux for 30 min and subsequently cooled to 100° C. At this point, a solution of oxime capped PDMS, formed using the method described above, was added. More specifically, the oxime capped PDMS was formed using 105.0 g toluene, 62.4 g silanol terminated PDMS (Gelest DMS-521, 45 dp) and 11.7 g MTO from Gelest. The oxime-PDMS was added quickly to the phenylsilsesquioxane hydrolyzate at 100° C., heated at reflux for 1 hrs after which n-butanol (12.0 g, Fisher Scientific) was added and further heated at reflux for another 3 hrs. Subsequently, the mixture was cooled to room temperature. The organosiloxane block copolymer formed herein was optically clear. Cast sheets are then formed by pouring the organosiloxane block copolymer onto a flat surface and evaporating the solvent overnight at room temperature. The cast sheets appear optically clear. After formation, the organosiloxane block copolymer of this example was analyzed by ²⁹Si NMR which confirms a structure of (Me₂SiO_(2/2))_(0.633)(MeSiO_(3/2))_(0.029)(PhSiO_(3/2))_(0.338) with 16.0 mol % OR³, wherein R³ is as described above.

Example 9 Formation of Organosiloxane Block Copolymer Using Oxime Terminated PDMS

An organosiloxane block copolymer was formed using oxime terminated PDMS and has approximately 18 mol % of Phenyl-T units which corresponds to about 28 wt % of Phenyl-T units. More specifically, a 500 mL 3-neck round bottom flask was loaded with a phenylsilsesquioxane hydrolyzate (Dow Corning 217 Flake, 16.8 g, 0.123 mol Si) and toluene (Fisher Scientific, 51.4 g) to form a mixture. The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus pre-filled with toluene and attached to a water-cooled condenser. A nitrogen blanket was then applied. An oil bath was used for heating.

The mixture was heated at reflux for 30 min and subsequently cooled to 100° C. At this point, a solution of oxime capped PDMS, formed using the method described above, was added. More specifically, the oxime capped PDMS was formed using 60.0 g toluene, 43.2 g silanol terminated PDMS (Gelest DMS-521, 45 dp) and 8.10 g MTO from Gelest. The oxime-PDMS was added quickly to the phenylsilsesquioxane hydrolyzate at 100° C., heated at reflux for 30 minutes after which n-butanol (6.0 g, Fisher Scientific) was added and further heated at reflux for another 3 hrs. At this point, some volatiles are then removed by distillation to increase a solids content to about 40 wt %. Subsequently, the mixture was cooled to room temperature. The organosiloxane block copolymer formed herein was optically clear. Cast sheets are then formed by pouring the organosiloxane block copolymer onto a flat surface and evaporating the solvent overnight at room temperature. The cast sheets appear optically clear. The organosiloxane block copolymer of this example has a composition of approximately (Me₂SiO_(2/2))_(0.82)(PhSiO_(3/2))_(0.18).

Example 10 Resin Linear Using Acetoxy Terminated PDMS

A 2 L 4neck round bottom flask was loaded with Dow Corning 217 Flake (137.5 g, 1.01 mols Si) and toluene (Fisher Scientific, 339.3 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied, Dean Stark was prefilled with toluene, and a heating mantle was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PDMS was added slowly (13 m). The diacetoxy terminated PDMS was prepared by adding a 50/50 wt % MTA/ETA (3.71 g, 0.0160 mols Si) mixture to a solution of 184 dp silanol terminated PDMS (Gelest DMS-S27, 112.5 g, 1.51 mols Si) dissolved in toluene (125.0 g). The solution was mixed for 30 min at room temperature under a nitrogen atmosphere. After the diacetoxy terminated PDMS was added, the reaction mixture was heated at reflux for 3 hrs. To induce resin-resin coupling 50/50 wt % MTA/ETA (23.58 g, 0.102 mols Si) was added at 108° C. The reaction mixture was heated at reflux for an additional 1 hr. It was cooled to 90° C. and then DI water (42.52 g) was added. Temperature was increased to reflux and left for 1 hr without removal of water. Water was then removed by azeotropic distillation. After the water was removed, heating was continued for 2 more hours at reflux. Volatiles (˜89 g) were then removed to increase the solids content to ˜40%. Material was cooled to room temperature and then pressure filtered through a 5.0 micrometer filter.

The composition of product as confirmed by ²⁹Si NMR was; (Me₂SiO_(2/2))_(0.582)(MeSiO_(3/2))_(0.045)(PhSiO_(3/2))_(0.373) with 15.8 mol % OZ. A TEM image (shown in FIG. 3) of a solid coating of the block copolymer of this example suggests nano-domains having a lamellar structure.

Example 11 PhMe Resin Linear Using 47 dp Diacetoxy Terminated PhMe Siloxane Composition: (PhMeSiO_(2/2))_(0.52)(PhSiO_(3/2))_(0.41) (45 wt % Phenyl-T)

A 500 mL 4neck round bottom flask was loaded with Dow Corning 217 Flake (45.0 g, 0.329 mols Si) and toluene (Fisher Scientific, 70.38 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied, Dean Stark was prefilled with toluene, and an oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PhMe siloxane was added quickly. The diacetoxy terminated PhMe siloxane was prepared by adding a 50/50 wt % MTA/ETA (3.34 g, 0.0144 mols Si) mixture to a solution of 47 dp silanol terminated PhMe siloxane (55.0 g, 0.403 mols Si) dissolved in toluene (29.62 g). The solution was mixed for 2 hrs at room temperature under a nitrogen atmosphere. After the diacetoxy terminated PhMe siloxane was added, the reaction mixture was heated at reflux for 2 hrs. At this stage 50/50 wt % MTA/ETA (6.94 g, 0.0300 mols Si) was added at 108° C. The reaction mixture was heated at reflux for an additional 1 hr. It was cooled to 90° C. and then DI water (15 mL) was added. Temperature was increased to reflux and the water was removed by azeotropic distillation. Reaction mixture was cooled again to 90° C. and more DI water (15 mL) was added. It was heated up to reflux and water was removed again. Some toluene (56.4 g) was then removed by distillation to increase the solids content. Material was cooled to room temperature and then pressure filtered through a 5.0 μm filter. Cast sheets (made by pouring the solution in a chase and evaporating the solvent) were optically clear.

Example 12 PhMe Resin Linear Using 140 dp Diacetoxy Terminated PhMe Siloxane Composition: (PhMeSiO_(2/2))_(0.52)(PhSiO_(3/2))_(0.42) (45 wt % Phenyl-T)

A 500 mL 4neck round bottom flask was loaded with Dow Corning 217 Flake (45.0 g, 0.329 mols Si) and toluene (Fisher Scientific, 70.38 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied, Dean Stark was prefilled with toluene, and an oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PhMe siloxane was added quickly. The diacetoxy terminated PhMe siloxane was prepared by adding a 50/50 wt % MTA/ETA (1.21 g, 0.00523 mols Si) mixture to a solution of 140 dp silanol terminated PhMe siloxane (55.0 g, 0.404 mols Si) dissolved in toluene (29.62 g). The solution was mixed for 2 hrs at room temperature under a nitrogen atmosphere. After the diacetoxy terminated PhMe siloxane was added, the reaction mixture was heated at reflux for 2 hrs. At this stage 50/50 wt % MTA/ETA (7.99 g, 0.0346 mols Si) was added at 108° C. The reaction mixture was heated at reflux for an additional 1 hr. It was cooled to 90° C. and then DI water (12 mL) was added. Temperature was increased to reflux and the water was removed by azeotropic distillation. Reaction mixture was cooled again to 90° C. and more DI water (12 mL) was added. It was heated up to reflux and water was removed again. Some toluene (56.9 g) was then removed by distillation to increase the solids content. Material was cooled to room temperature and then pressure filtered through a 5.0 μm filter. Cast sheets (made by pouring the solution in a chase and evaporating the solvent) were optically clear.

Example 13 PhMe Resin Linear Using 230 dp Diacetoxy Terminated PhMe Siloxane Composition: (PhMeSiO_(2/2))_(0.53)(PhSiO_(3/2))_(0.41) (45 wt % Phenyl-T)

A 500 mL 4neck round bottom flask was loaded with Dow Corning 217 Flake (45.0 g, 0.329 mols Si) and toluene (Fisher Scientific, 70.38 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied, Dean Stark was prefilled with toluene, and an oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PhMe siloxane was added quickly. The diacetoxy terminated PhMe siloxane was prepared by adding a 50/50 wt % MTA/ETA (0.82 g, 0.00355 mols Si) mixture to a solution of 230 dp silanol terminated PhMe siloxane (55.0 g, 0.404 mols Si) dissolved in toluene (29.62 g). The solution was mixed for 2 hrs at room temperature under a nitrogen atmosphere. After the diacetoxy terminated PhMe siloxane was added, the reaction mixture was heated at reflux for 2 hrs. At this stage 50/50 wt % MTA/ETA (9.89 g, 0.0428 mols Si) was added at 108° C. The reaction mixture was heated at reflux for an additional 1 hr. It was cooled to 90° C. and then DI water (15 mL) was added. Temperature was increased to reflux and the water was removed by azeotropic distillation. Reaction mixture was cooled again to 90° C. and more DI water (15 mL) was added. It was heated up to reflux and water was removed again. Some toluene (57.0 g) was then removed by distillation to increase the solids content. Material was cooled to room temperature and then pressure filtered through a 5.0 μm filter. Cast sheets (made by pouring the solution in a chase and evaporating the solvent) were optically clear.

Example 14 PhMe Resin Linear Using 140 dp Diacetoxy Terminated PhMe Siloxane Composition: (PhMeSiO_(2/2))_(0.64)(PhSiO_(3/2))_(0.32) (35 wt % Phenyl-T)

A 500 mL 4neck round bottom flask was loaded with Dow Corning 217 Flake (35.0 g, 0.256 mols Si) and toluene (Fisher Scientific, 65.0 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied, Dean Stark was prefilled with toluene, and an oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PhMe siloxane was added quickly. The diacetoxy terminated PhMe siloxane was prepared by adding a 50/50 wt % MTA/ETA (1.44 g, 0.00623 mols Si) mixture to a solution of 140 dp silanol terminated PhMe siloxane (65.0 g, 0.477 mols Si) dissolved in toluene (35.0 g). The solution was mixed for 2 hrs at room temperature under a nitrogen atmosphere. After the diacetoxy terminated PhMe siloxane was added, the reaction mixture was heated at reflux for 2 hrs. At this stage 50/50 wt % MTA/ETA (6.21 g, 0.0269 mols Si) was added at 108° C. The reaction mixture was heated at reflux for an additional 1 hr. It was cooled to 90° C. and then DI water (12 mL) was added. Temperature was increased to reflux and the water was removed by azeotropic distillation. Reaction mixture was cooled again to 90° C. and more DI water (12 mL) was added. It was heated up to reflux and water was removed again. Some toluene (54.0 g) was then removed by distillation to increase the solids content. Material was cooled to room temperature and then pressure filtered through a 5.0 μm filter. Cast sheets (made by pouring the solution in a chase and evaporating the solvent) were optically clear.

Example 15 PhMe Resin Linear Using 140 dp Diacetoxy Terminated PhMe Siloxane Composition: (PhMeSiO_(2/2))_(0.42)(PhSiO_(3/2))_(0.51) (55 wt % Phenyl-T)

A 500 mL 4neck round bottom flask was loaded with Dow Corning 217 Flake (55.0 g, 0.403 mols Si) and toluene (Fisher Scientific, 75.77 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied, Dean Stark was prefilled with toluene, and an oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PhMe siloxane was added quickly. The diacetoxy terminated PhMe siloxane was prepared by adding a 50/50 wt % MTA/ETA (0.99 g, 0.00428 mols Si) mixture to a solution of 140 dp silanol terminated PhMe siloxane (45.0 g, 0.330 mols Si) dissolved in toluene (24.23 g). The solution was mixed for 2 hrs at room temperature under a nitrogen atmosphere. After the diacetoxy terminated PhMe siloxane was added, the reaction mixture was heated at reflux for 2 hrs. At this stage 50/50 wt % MTA/ETA (9.77 g, 0.0423 mols Si) was added at 108° C. The reaction mixture was heated at reflux for an additional 1 hr. It was cooled to 90° C. and then DI water (15 mL) was added. Temperature was increased to reflux and the water was removed by azeotropic distillation. Reaction mixture was cooled again to 90° C. and more DI water (15 mL) was added. It was heated up to reflux and water was removed again. Some toluene (56.7 g) was then removed by distillation to increase the solids content. Material was cooled to room temperature and then pressure filtered through a 5.0 μm filter. Cast sheets (made by pouring the solution in a chase and evaporating the solvent) were optically clear.

Example 16 Naphthyl Resin Linear Using 140 Dp Diacetoxy Terminated PhMe Siloxane Composition: 45 wt % Naphthyl-T

A 50 mL 1neck round bottom flask was loaded with 2.4 g of a naphthyl-T hydrolyzate resin flake (prepared by hydrolyzing naphthyl trimethoxysilane used as purchased from Gelest) and toluene (Fisher Scientific, 5.6 g). The flask was equipped with a magnetic stir bar and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied, Dean Stark was prefilled with toluene, and an oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 108° C., a solution of diacetoxy terminated PhMe siloxane was added quickly. The diacetoxy terminated PhMe siloxane was prepared by adding a 50/50 wt % MTA/ETA (0.065 g, 0.00028 mols Si) mixture to a solution of 140 dp silanol terminated PhMe siloxane (2.93 g, 0.0215 mols Si) dissolved in toluene (6.84 g). The solution was mixed for 2 hrs at room temperature under a nitrogen atmosphere. After the diacetoxy terminated PhMe siloxane was added, the reaction mixture was heated at reflux for 2 hrs. At this point the following process was repeated 3×: [50/50 wt % MTA/ETA (0.21 g, 0.000908 mols Si) was added at 108° C. The reaction mixture was heated at reflux for 1 hr. It was cooled to 90° C. and then DI water (2 mL) was added. Temperature was increased to reflux and the water was removed by azeotropic distillation. Cast sheets were optically clear.

Comparative Example 1 Resin-Linear Using Acetoxy Terminated PDMS Composition: (Me₂SiO_(2/2))_(0.82)(PhSiO_(3/2))_(0.17) (28 wt % Phenyl-T) based on 184 dp PDMS

A 500 mL 3neck round bottom flask was loaded with a phenylsilsesquioxane hydrolyzate (Dow Corning 217 Flake, 16.8 g, 0.123 mols Si) and toluene (Fisher Scientific, 60.0 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied. The Dean Stark was prefilled with toluene. An oil bath was used for heating. The reaction mixture was heated at reflux for 1 hour. After cooling the reaction mixture to 100° C., a solution of acetoxy terminated PDMS was added. The acetoxy terminated PDMS was made according to example 2 using toluene (80.0 g), 184 dp silanol terminated PDMS (Dow Corning® SFD750, 43.20 g, 0.581 mols Si), and ETS-900 (Dow Corning, 1.54 g, 0.00663 mols). The acetoxy terminated PDMS was added quickly to the phenylsilsesquioxane hydrolyzate solution at 100° C. The reaction mixture was heated at reflux for a total of 11 hours. After this many hours a dried film was still opaque. Note: this example shows that Resin-Linear coupling alone is not sufficient to generate optically clear resin-linear films.

Comparative Example 2 KOH Bodied Resin-Linear Composition: (Me₂SiO_(2/2))_(0.82)(PhSiO_(3/2))_(0.18) (29 wt % Ph-T, R/L ratio 4/1)

The resin-linear copolymer of this example was prepared using the procedure disclosed by Metevia V. L.; Polmanteer K. E. in U.S. Pat. No. 3,308,203.

A 500 mL 3neck round bottom flask was loaded with phenyl silsequioxane hydrolyzate (18.2 g, 0.133 mols Si), 184 dP silanol terminated PDMS (45.0 g, 0.606 mols Si), and toluene (189.6 g). Flask was equipped with a thermometer, magnetic stir bar, and a Dean Stark apparatus attached to a water-cooled condenser. An aqueous solution of 45.7 wt % potassium hydroxide (0.553 g) was added at room temperature with stirring. Reaction mixture was heated at reflux for a total of 7.5 hours and neutralized with dry-ice and filtered through a 1.2 um filter. Solventless product was a hazy viscous liquid.

Comparative Example 3 Ethoxy Terminated PDMS Approach Triethoxy Terminated 184 dp PDMS Procedure

The resin-linear copolymer of this example was prepared using the procedure disclosed by Katsoulis D. E.; Keryk J. R.; McGarry F. J.; Zhu B. in U.S. Pat. No. 5,830,950.

A 500 mL 3neck round bottom flask was loaded with silanol terminated 184 dp PDMS (Gelest DMS-S27, 175.0 g, 2.36 mols Si) and tetraethoxysilane (TEOS) (Gelest, 53.5 g, 0.257 mols) and potassium acetate (Fisher Scientific, 0.229 g). The flask was equipped with a thermometer, teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. Heated at 150° C. for 20 hrs. 29Si NMR analysis indicated ˜44% of SiOH groups still left. Added more potassium acetate (0.916 g). Heated at 150° C. for 33 more hours. Pressure filtered through a 1.2 μm filter. Stripped to dryness using a rotavapor at an oil bath temperature of 100° C. under vacuum. 29Si NMR analysis indicated no presence of SiOH groups and no TEOS. GPC analysis of product:

Sample Mn Mw PD Silanol terminated 184 dp PDMS  9,510 29,400 3.09 Triethoxy terminated PDMS 13,300 32,700 2.46

The triethoxy terminated PDMS was further reacted with a phenylsilsesquioxane hydrolyzate as according to the following procedure.

A 500 mL 3neck round bottom flask was loaded with a phenylsilsesquioxane hydrolyzate (Dow Corning 217 Flake, 16.8 g, 0.123 mols Si) and toluene (Fisher Scientific, 60.0 g). The flask was equipped with a thermometer, Teflon stir paddle, and a Dean Stark apparatus attached to a water-cooled condenser. A nitrogen blanket was applied. The Dean Stark was prefilled with toluene. An oil bath was used for heating. The reaction mixture was heated at reflux for 30 min. After cooling the reaction mixture to 100° C., a solution of triethoxy terminated PDMS (43.2 g) and toluene (80.0 g) were added. Reaction mixture turned opaque. Added just enough toluene (44.1 g) to make the solution turn clear. Added tetra-n-butoxy titantate (DuPont Tyzor TnBT, 1.22 g). Reaction mixture turned opaque. Added just enough toluene (52.8 g) to make it turn clear. Heated at reflux for a total of 15 hours. Dried film was still opaque.

TABLE 1 G′drop, Viscosity G′ rise, Free Domain ° C. at 120° C., ° C. Copolymer resin size, nm (FLOW) Pa · s (CURE) Mw, g/mol wt % (AFM) Example 3 50 90,400 142 237,000 9.4 12 Example 4 67 76,343 146 144,000 13.5 16 Example 5 70 64,000 143 169,000 not 20 measured Example 6 113 320,000 185 148,000 not 21 measured Example 7 100 47,100 209 97,000 13 16 Example 8 54 40,000 133 not not <10 measured measured Example 9 not not not not not <10 measured measured measured measured measured Example 10 57 1,660,000 158 86,300 32 22 Example 11 30 42 139 59,200 7.8 not measured Example 12 63 93 183 61,100 20 10 Example 13 101 11,219 170 66,900 24.7 not measured Example 14 48 72 179 104,000 14.5 not measured Example 15 76 360 196 47,100 26.4 not measured Example 16 76 244 177 not not not measured measured measured 

1. A process for preparing a resin-linear organosiloxane block copolymer comprising: I) reacting a) a linear organosiloxane having the formula R¹ _(q)(E)_((3-q))SiO(R¹ ₂SiO_(2/2))_(n)Si(E)_((3-q))R¹ _(q), where each R¹ is independently a C₁ to C₃₀ hydrocarbyl, n is 10 to 400, q is 0, 1, or 2, E is a hydrolyzable group containing at least one carbon atom, and b) an organosiloxane resin comprising at least 60 mol % of [R²SiO_(3/2)] siloxy units in its formula, where each R² is independently a C₁ to C₂₀ hydrocarbyl, in c) an organic solvent to form a resin-linear organosiloxane block copolymer; wherein the amounts of a) and b) used in step I are selected to provide the resin-linear organosiloxane block copolymer with 40 to 90 mol % of disiloxy units [R¹ ₂SiO_(2/2)] and 10 to 60 mol % of trisiloxy units [R²SiO_(3/2)], and wherein at least 95 weight percent of the linear organosiloxane added in step I is incorporated into the resin-linear organosiloxane block copolymer, II) reacting the resin-linear organosiloxane block copolymer from step I) to crosslink the trisiloxy units of the resin-linear organosiloxane block copolymer sufficiently to increase the average molecular weight (M_(w)) of the resin-linear organosiloxane block copolymer by at least 50%, III) optionally, further processing the resin-linear organosiloxane block copolymer to enhance storage stability and/or optical clarity, IV) optionally, removing the organic solvent.
 2. The process of claim 1 where E is selected from an oximo, epoxy, carboxy, amino, or amido group.
 3. The process of claim 1 where E is R¹C(═O)O—, R¹ ₂C═N—O—, or R⁴C═N—O— where R⁴ is hydrocarbylene.
 4. The process of claim 1 wherein where E is H₃CC(═O)O—, and q is
 1. 5. The process of claim 1 wherein an organosilane having the formula R⁵ _(q)SiX_(4-q) is added during step II), where R⁵ is a C₁ to C₈ hydrocarbyl or a C₁ to C₈ halogen-substituted hydrocarbyl, X is a hydrolysable group, and q is 0, 1, or
 2. 6. The process of claim 5 wherein the organosilane is an alkyltriacetoxysilane.
 7. The process of claim 6 wherein the alkyltriacetoxysilane is a mixture of methyltriacetoxysilane and ethyltriacetoxysilane.
 8. The process of claim 5 wherein the amount of organosilane added provides a molar stoichiometry of 2 to 15 mol % of organosilane per mole of Si on the organosiloxane resin.
 9. The process of claim 6 wherein step III is performed by reacting the resin-linear organosiloxane from step II with water and removing acetic acid.
 10. The process of claim 1 wherein where E is (CH₃)(CH₃CH₂)C═N—O—, and q is
 1. 11. The process of claim 1 wherein step III is performed by reacting the resin-linear organosiloxane from step II with an endcapping compound selected from an alcohol, oxime, or trialkylsiloxy compound.
 12. The process of claim 11 wherein the endcapping compound is n-butanol.
 13. The process of claim 1 wherein the organosiloxane resin is a silsesquioxane resin.
 14. The process of claim 1 wherein the organosiloxane has silanol content of at least 10 mole %
 15. The process of claim 13 wherein R² is methyl or phenyl.
 16. The process of claim 13 wherein R² is phenyl.
 17. The process of claim 13 wherein R² is napthyl.
 18. The process of claim 1 wherein R¹ is methyl or phenyl.
 19. The process of claim 1 where the linear organosiloxane has the formula (CH₃)_(q)(E)_((3-q))SiO[(CH₃)₂SiO_(2/2))]_(n)Si(E)_((3-q))(CH₃)_(q).
 20. The process of claim 1 where the linear organosiloxane has the formula (CH₃)_(q)(E)_((3-q))SiO[(CH₃)(C₆H₅)SiO_(2/2))]_(n)Si(E)_((3-q))(CH₃)_(q).
 21. The process of claim 19 where E is H₃CC(═O)O— and q is
 1. 22. A resin-linear organosiloxane block copolymer prepared by the process of claim
 1. 23. A method of forming a coating comprising applying a film of the resin-linear organosiloxane block copolymer of claim 22 on a surface and curing the film to form a coating.
 24. A solid composition comprising the resin-linear organosiloxane of claim
 22. 25. The process of claim 20 where E is H₃CC(═O)O— and q is
 1. 